Skip to main content

NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Evaluation of Low-Ohmic Resistance Measurement Capabilities Between VSL and NIST

Published

Author(s)

Marlin E. Kraft, Jan van der Beek, Gert Rietveld

Abstract

The low-ohmic resistance measurement capa¬bilities of VSL and NIST were compared using a set of resistors with values 100 mOhm, 10 mOhm, 1 mOhm, and 100 mOhm respectively. The measurement data of both laboratories generally agree well within the combined measurement uncertainties, ranging from 0.54 uOhm/Ohm at 100 mOhm to 4.3 uOhm/Ohm at 100 uOhm (k = 2). Careful transport of the resistors was crucial for achieving this result.
Proceedings Title
CPEM 2012 Conference Digest
Conference Dates
July 1-6, 2012
Conference Location
National Harbor, MD
Conference Title
CPEM 2012

Keywords

resistance measurements, resistors, shunts, low-ohmic measurements, precision measurements, comparison.

Citation

Kraft, M. , van, J. and Rietveld, G. (2012), Evaluation of Low-Ohmic Resistance Measurement Capabilities Between VSL and NIST, CPEM 2012 Conference Digest , National Harbor, MD (Accessed October 18, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created September 1, 2012, Updated February 19, 2017
Was this page helpful?