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Electrodeposition of Aluminum-Hafnium Alloy from the Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Molten Salt.

Published

Author(s)

Tetsuya Tsuda, Susuma Kuwabata, Gery R. Stafford, Charles Hussey

Abstract

The electrochemistry of Hf(IV) and the electrodeposition of Al-Hf alloys was examined in the Lewis acidic aluminum chloride-1-ethyl-3-methylimidazolium chloride (AlCl_(3)-[EtMeIm]Cl) (66.7 % mole fraction AlCl_(3)) molten salt containing HfCl_(4). When cyclic staircase voltammetry was carried out at a platinum disk electrode in this melt, the deposition and stripping waves for Al shifted to negative and positive potentials, respectively, suggesting that the aluminum stripping is more difficult due to the formation of Al-Hf alloys. Al-Hf alloy electrodeposits containing up to 13 % atomic fraction Hf were obtained on Cu rotating wire and cylinder electrodes. The Hf content in the Al-Hf alloy deposits depended on the HfCl_(4) concentration in the melt, the electrodeposition temperature, and the applied current density. The deposits were composed of dense crystals and were completely chloride free. The chloride-induced pitting corrosion potential of the resulting Al-Hf alloys was approximately +0.30 V against pure aluminum when the Hf content was above 10 at %.
Citation
Journal of Solid State Electrochemistry

Citation

Tsuda, T. , Kuwabata, S. , Stafford, G. and Hussey, C. (2012), Electrodeposition of Aluminum-Hafnium Alloy from the Lewis Acidic Aluminum Chloride-1-Ethyl-3-methylimidazolium Chloride Molten Salt., Journal of Solid State Electrochemistry (Accessed April 14, 2024)
Created November 12, 2012, Updated October 12, 2021