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Electrochemistry of Titanium and the Electrodeposition of Al-Ti Alloys in the Lewis Acidic Aluminum Chloride-1-Ethyl-3-Methylimidazolium Chloride Melt

Published

Author(s)

T Tsuda, C L. Hussey, Gery R. Stafford, John E. Bonevich

Abstract

The chemical and electrochemical behavior of titanium was examined in the Lewis acidic aluminum chloride-l-ethyl-3-methylimidazolium chloride (AlCl3-EtMelmCl) molten salt at 353.2 K. Dissolved Ti (II), as TiCl2, is stable in the 66.7 : 33.3 m/o composition of this melt, but shows a slight tendency to disproportionate in the 60.0-40.0 m/o melt. At low current densities, the anodic oxidation of Ti (0) does not lead to dissolved Ti (II), but to an insoluble passivating film of TiCl3. At high current densities or very positive potentials, Ti (O) is oxidized to Ti (IV); however, the electrogenerated TI (IV) vaporizes from the melt as TiCl4(g). As found by other researchers working in Lewis acidic AlCl3-NaCl, TI (II) tends to form polymers as its concentration in the AlCl3-EtMelmCl melt is increased. The electrodeposition of Al-Ti alloys was investigated at Cu rotating disk and wire electrodes. Al-Ti alloys containing up to approximately equal to} 19 a/o titanium could be electrodeposited from saturated solutions of TI (II) in the 66.7 : 33.3 m/o melt at low current densities, but the titanium content of these alloys decreased as the reduction current density was increased. The pitting potentials of these electrodeposited Al-Ti alloys exhibited a positive shift with increasing titanium content comparable to that observed for alloys prepared by sputter deposition.
Citation
Journal of the Electrochemical Society
Volume
150 No. 4

Keywords

aluminum chloride, aluminum titanium, current densities, electrodeposited

Citation

Tsuda, T. , Hussey, C. , Stafford, G. and Bonevich, J. (2003), Electrochemistry of Titanium and the Electrodeposition of Al-Ti Alloys in the Lewis Acidic Aluminum Chloride-1-Ethyl-3-Methylimidazolium Chloride Melt, Journal of the Electrochemical Society, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853189 (Accessed April 20, 2024)
Created March 31, 2003, Updated October 12, 2021