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Effect of Organic SAMs on the Evolution of Strength of Silicon Nanostructures

Published

Author(s)

Scott Grutzik, Brian G. Bush, Frank W. DelRio, Richard S. Gates, Melissa Hines, Alan Zehnder

Abstract

The ability to accurately predict the strength of nanoscale, single crystal structures is critical in micro- and nano-electromechanical systems (MEMS and NEMS) design. Because of the small length scales involved failure does not always follow the same trends as at larger sizes. Due to low defect density and high surface to volume ratio, failure is primarily dependent on surface features. Previous work has shown that oxidation of the surface of silicon nanos-structures correlates to decreased strength and that methyl surface monolayers can be used to slow oxidation and maintain initial strength. We extend these results to use longer chain self assembled monolayers (SAMs) prepared in a variety of ways. Although only initial results are included here, aging will be carried out over a much longer time period than in previous studies. Fracture tests were performed using an atomic force microscope (AFM) in a method previously demonstrated by Alan, et al.
Proceedings Title
SEM at 70: From Photoelasticity to DIC and Beyond
Conference Dates
June 3-5, 2013
Conference Location
Lombard, IL, US
Conference Title
SEM 2013 Annual Conference & Exposition on Experimental and Applied Mechanics

Keywords

silicon, nanoscale strength, nanoscale testing, SAM, AFM

Citation

Grutzik, S. , Bush, B. , DelRio, F. , Gates, R. , Hines, M. and Zehnder, A. (2013), Effect of Organic SAMs on the Evolution of Strength of Silicon Nanostructures, SEM at 70: From Photoelasticity to DIC and Beyond, Lombard, IL, US, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913502 (Accessed April 18, 2024)
Created June 2, 2013, Updated October 12, 2021