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Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX

Published

Author(s)

S. Bagchi, J. H. Lee, S. J. Krause, Peter Roitman
Proceedings Title
Extended Abstracts of the 1995 IEEE SOI Conference
Issue
6
Conference Dates
October 2-5, 1995
Conference Location
Tucson, AZ, USA

Citation

Bagchi, S. , Lee, J. , Krause, S. and Roitman, P. (1995), Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX, Extended Abstracts of the 1995 IEEE SOI Conference, Tucson, AZ, USA (Accessed February 27, 2024)
Created December 30, 1995, Updated October 12, 2021