Bagchi, S.
, Lee, J.
, Krause, S.
and Roitman, P.
(1995),
Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX, Extended Abstracts of the 1995 IEEE SOI Conference, Tucson, AZ, USA
(Accessed December 11, 2024)
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Effect of Implant Dose on Formation of Buried Oxide Si Islands in Low-Dose SIMOX
Published
Author(s)
S. Bagchi, J. H. Lee, S. J. Krause,
Proceedings Title
Extended Abstracts of the 1995 IEEE SOI Conference
Issue
6
Conference Dates
October 2-5, 1995
Conference Location
Tucson, AZ, USA
Pub Type
Conferences
Citation
Issues
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Created December 30, 1995, Updated October 12, 2021