Germer, T.
and Patrick, H.
(2010),
Effect of Bandwidth and Numerical Aperture in Optical Scatterometry, Metrology, Inspection, and Process Control for Microlithography XXIV, San Jose, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905013
(Accessed December 4, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Effect of Bandwidth and Numerical Aperture in Optical Scatterometry
Published
Author(s)
,
Abstract
We consider the effects of finite spectral bandwidth and numerical aperture in scatterometry measurements and discuss efficient integration methods based upon Gaussian quadrature in one dimension (for spectral bandwidth averaging) and two dimensions inside a circle (for numerical aperture averaging). Provided the wavelength is not near a Wood's anomaly, we find that the resulting methods converge very quickly to a level suitable for most measurement applications. In the vicinity of a Wood's anomaly, however, the methods provide rather poor behavior. We also describe a method that can be used to extract the effective spectral bandwidth and numerical aperture for a scatterometry tool. We find that accounting for spectral bandwidth and numerical aperture is necessary to obtain satisfactory results in scatterometry.Proceedings Title
Metrology, Inspection, and Process Control for Microlithography XXIV
Conference Dates
February 21-25, 2010
Conference Location
San Jose, CA
Pub Type
Conferences
Download Paper
Keywords
optical critical dimension metrology, scatterometry
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created March 1, 2010, Updated February 19, 2017