Jacobs, C.
, Genis, A.
, Allen, L.
and Roitman, P.
(1994),
Effect of Anneal Temperature on Si/Buried Oxide Interface Roughness of SIMOX, Proc., 1994 IEEE SOI Conference, Nantucket, MA, USA (Accessed April 30, 2026)
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Effect of Anneal Temperature on Si/Buried Oxide Interface Roughness of SIMOX
Published
Author(s)
C. Jacobs, A. Genis, L. P. Allen,
Proceedings Title
Proc., 1994 IEEE SOI Conference
Conference Dates
October 4-6, 1994
Conference Location
Nantucket, MA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created December 30, 1994, Updated October 12, 2021