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Design and Demonstration of PECVD Angled Multilayer Dielectric Mirrors Optimized for Micromachined Cavity Sidewalls

Published

Author(s)

M.A. Perez, John Kitching, A Shkel

Abstract

This paper reports on the design and implementation of high efficiency, non-metallic reflectors integrated on the sidewalls of micromachined cavities. Due to shadowing from deposition within a cavity, significant variation in the thicknesses of the dielectric thin films composing the reflectors are encountered when the layers are deposited using Plasma Enhanced Chemical Vapor Deposition (PECVD). These gradients in thickness limit the performance of the reflector at the intended design wavelength. An optimized design procedure is described to maximize the performance of the reflector at the D1 absorption wavelength of 87Rb of 795 nm under the variations in material thickness for use in a micromachined atomic vapor cells. The reflector design is based on multiple shifted quarter wave Bragg reflectors in series, which extend the reflective bandwidth for increased robustness to film thickness gradients. The extended reflectance range maintains high reflection at the design wavelength despite greater than 70 % decrease in film thickness across the reflector surface. The reflector technology is ideally suited for use in atomic MEMS vapor cell applications by achieving high reflectance while maintaining light polarization. We demonstrate less than 1.5 dB of return loss with circular polarization ellipticity maintained to ±2°.
Citation
Sensors and Actuators A-Physical
Volume
155

Keywords

atomic MEMS, vapor cells, optical MEMS, Bragg reflector, thin films, PECVD, magnetometer, gyroscope

Citation

Perez, M. , Kitching, J. and Shkel, A. (2008), Design and Demonstration of PECVD Angled Multilayer Dielectric Mirrors Optimized for Micromachined Cavity Sidewalls, Sensors and Actuators A-Physical, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=842528 (Accessed June 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created October 24, 2008, Updated October 12, 2021