Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Cubic Silsesquioxanes as Tunable High Performance Coating Materials

Published

Author(s)

Christopher Soles, Hyun W. Ro, Aaron M. Forster, Dave J. Krug, Vera Popova, Richard M. Laine

Abstract

In this manuscript a series of cubic silsequioxane monomers with their eight vertices functionalized with different organic ligands terminated with triethoxysilane groups were acid hydrolyzed, spin cast into thin films, and then vitrified into hard organosilicate films. Both the length of the organic ligands and the number of triethoxysilane groups were varied to change the degree of cross-linking and cubic silsequioxane content of the vitrified films. This resulted in a series of high quality optical coatings with excellent properties characterized in terms of their porosity, density, coefficient of thermal expansion, modulus, hardness, and surface energy. In general, higher concentrations of the cubic silsequioxane moiety in the network and higher cross-link densities led to enhanced mechanical properties, lower porosity, higher density, lower thermal expansion, and a very hydrophilic surface. The manner by which these properties can be tuned via the cubic silsesquioxane content is discussed in the comparison to the structure-property relations for other spin on silsequioxane type films.
Citation
Applied Organometallic Chemistry

Keywords

thin film, organosilicate, low k dielectric, porous materials, coatings, X-ray refelctivity, X-ray porosimetry

Citation

Soles, C. , Ro, H. , Forster, A. , Krug, D. , Popova, V. and Laine, R. (2013), Cubic Silsesquioxanes as Tunable High Performance Coating Materials, Applied Organometallic Chemistry, [online], https://doi.org/10.1002/aoc.3032 (Accessed May 24, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created June 19, 2013, Updated February 10, 2023