Mayo, S.
, Koyama, R.
and Leedy, T.
(1978),
Control of mobile-ion contamination in oxidation ambients for MOS device processing:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.77-1404
(Accessed October 6, 2024)
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Control of mobile-ion contamination in oxidation ambients for MOS device processing:
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- NBS IR 77-1404
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NBS IR 77-1404
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NIST Pubs
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Created January 1, 1978, Updated May 19, 2023