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Characterizing Surface Roughness of Thin Films by Polarized Light Scattering

Published

Author(s)

Thomas A. Germer, Michael J. Fasolka

Abstract

The polarization of light scattered by the surface of a material contains information that can be used to identify the sources of that scatter. In this paper, first order vector perturbation theory for light scattering from interfacial roughness of a dielectric layer is reviewed. In addition, methods for calculating the Stokes vector for scatter from multiple sources and for decomposing a Stokes vector into contributions from two non-depolarizing scattering sources are provided. The polarization of light scattered from interfacial roughness depends upon the relative roughness of the two interfaces and the degree of phase correlation between the two interfaces. Experimental results are presented for three cases: a nominally conformal film, a nominally anticonformal film, and a lateral offset roughness film. The method works well for the nearly conformal film. Difficulties that arise for the other two cases are discussed.
Proceedings Title
Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies | SPIE
Volume
5188
Conference Dates
August 3-8, 0200
Conference Title
Proceedings of SPIE--the International Society for Optical Engineering

Keywords

block copolymer, overlay, polarization, roughness, scattering, silicon dioxide, thin films

Citation

Germer, T. and Fasolka, M. (2003), Characterizing Surface Roughness of Thin Films by Polarized Light Scattering, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies | SPIE (Accessed February 21, 2024)
Created November 1, 2003, Updated February 17, 2017