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Characterization of Pore Structure in a Nanoporous Low-Dielectric Constant Thin Film by Neutron Scattering Porosimetry and X-ray Porosimetry

Published

Author(s)

R C. Hedden, V. J. Lee, Christopher L. Soles, Barry J. Bauer
Citation
Langmuir
Volume
ASAP(on-line)

Keywords

Electronic Materials, Thin Films, film density, neutron scattering porosimetry, porosimetry, porous low-k dielectric material, small-angle neutron scattering, x-ray porosimetry

Citation

Hedden, R. , Lee, V. , Soles, C. and Bauer, B. (2004), Characterization of Pore Structure in a Nanoporous Low-Dielectric Constant Thin Film by Neutron Scattering Porosimetry and X-ray Porosimetry, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853934 (Accessed June 23, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2004, Updated February 17, 2017