Tsai, B.
, Lovas f, J.
, DeWitt, D.
, Kreider, K.
and Burns g, B.
(1997),
In Chamber Thermometry Calibration Using A Si Proof Wafer, 5th International Conference on Advanced Thermal Processing of Semiconductors, New Orleans, LA, USA
(Accessed December 12, 2024)
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In Chamber Thermometry Calibration Using A Si Proof Wafer
Published
Author(s)
B Tsai, J Lovas f, D P. Dewitt, , Burns g
Proceedings Title
5th International Conference on Advanced Thermal Processing of Semiconductors
Volume
5
Conference Dates
September 3-5, 1997
Conference Location
New Orleans, LA, USA
Conference Title
Proceedings of the 5th International Conference on Advanced Thermal Processing of Semiconductors
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created September 2, 1997, Updated October 12, 2021