Bertness, K.
, Wilhelm, T.
, Kohlberg, A.
, Baboli, M.
, Abrand, A.
and Mohseni, P.
(2019),
Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching, ECS Journal of Solid State Science and Technology, [online], https://doi.org/10.1149/2.0311906jss
(Accessed October 8, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching
Published
Author(s)
, Thomas Wilhelm, Alex Kohlberg, Mohadeseh Baboli, Alireza Abrand, Parsian Mohseni
Abstract
A highly practical nanofabrication process is detailed here for the generation of black GaAs. Discontinuous thin films of Au nanoparticles are electrodeposited onto GaAs substrates to catalyze site-specific etching in a solution of KMnO4 and HF according to the metal-assisted chemical etching mechanism. This provides a completely solution-based and lithography-free method for fabrication of sub-wavelength nanostructure arrays, which exhibit solar-weighted reflectance approaching 4%. This two-step benchtop process can be entirely performed at room-temperature without lithographic patterning or vacuum instrumentation, providing an alternative high- throughput nanotexturing approach for thin-film photovoltaics applications.Citation
ECS Journal of Solid State Science and Technology
Volume
8
Issue
6
Pub Type
Journals
Download Paper
Keywords
metal-assisted chemical etching, photovoltaics
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created June 19, 2019, Updated December 19, 2019