Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers
J C. Garno, Christopher D. Zangmeister, J Batteas
Automated scanned probe lithography has been employed to form nanoscale Cu structures through electroless metal deposition onto patterned carboxylic acid terminated self-assembled monolayers. Using this approach, Cu structures of ~ 40 nm 200 nm in lateral dimension by ~ 4 nm 6 nm in thickness were formed. Precise control of the patterning process and deposition solution conditions affords sub-nm control of the patterned architectures. The application of this process for the construction of organic based optoeletronics is discussed.
, Zangmeister, C.
and Batteas, J.
Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers, Journal of the American Chemical Society
(Accessed December 4, 2023)