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Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers

Published

Author(s)

J C. Garno, Christopher D. Zangmeister, J Batteas

Abstract

Automated scanned probe lithography has been employed to form nanoscale Cu structures through electroless metal deposition onto patterned carboxylic acid terminated self-assembled monolayers. Using this approach, Cu structures of ~ 40 nm 200 nm in lateral dimension by ~ 4 nm 6 nm in thickness were formed. Precise control of the patterning process and deposition solution conditions affords sub-nm control of the patterned architectures. The application of this process for the construction of organic based optoeletronics is discussed.
Citation
Journal of the American Chemical Society
Volume
23

Keywords

AFM, molecular electronics, nanolithography, nanoscale materials, optolectronics

Citation

Garno, J. , Zangmeister, C. and Batteas, J. (2007), Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers, Journal of the American Chemical Society (Accessed June 13, 2024)

Issues

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Created July 1, 2007, Updated February 19, 2017