Zhu, X.
, Gu, H.
, Li, Q.
, Baumgart, H.
, Ioannou, D.
, Suehle, J.
and Richter, C.
(2009),
Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories (Accessed May 19, 2026)
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Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories
Published
Author(s)
Xiaoxiao Zhu, H Gu, Qiliang Li, Helmut Baumgart, D. E. Ioannou, ,
Pub Type
Talks
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Created October 6, 2009, Updated May 7, 2026