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Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories

Published

Author(s)

Xiaoxiao Zhu, H Gu, Qiliang Li, Helmut Baumgart, D. E. Ioannou, John S. Suehle, Curt A. Richter

Citation

Zhu, X. , Gu, H. , Li, Q. , Baumgart, H. , Ioannou, D. , Suehle, J. and Richter, C. (2009), Application of ALD High-k Dielectric Films as Charge Storage Layer and Blocking Oxide in Nonvolatile Memories (Accessed February 21, 2024)
Created October 5, 2009, Updated October 12, 2021