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An Analytical Method to Quantify Silica Nanoparticles Accumulated on the Surface of Polymer Nanocomposites Exposed to UV Radiation

Published

Author(s)

Savelas A. Rabb, Lee L. Yu, Coralie Bernard

Abstract

Three films containing different mass fractions (0 %, 5 % and 10 %) of silica (SiO2) nanoparticles have been subjected to controlled degradation conditions at specified humidity, temperature, and ultraviolet (UV) radiation doses over a period of 59 days. The mass fraction of extracted nanosilica is measured by inductively coupled plasma–optical emission spectroscopy (ICP-OES). Results show the presence of nanosilica on the films containing 5 % and 10 % nanosilica, regardless of the exposure conditions. However, after UV exposure for 59 days, the mass fraction of nanosilica in the extracted solutions increase by factors of 2.3 and 1.7 for the 5 % and 10 % nanosilica films, respectively. Measurement variability is lower for the 10 % nanosilica films, likely due to the larger mass of nanosilica that is released. Results of this study will assist in establishing a reliable and sensitive method for measuring the release rate of silica nanoparticles from UV-irradiated polymer nanocomposites.
Proceedings Title
Nanotech Conference Technical Proceedings
Conference Dates
June 21-24, 2010
Conference Location
Anaheim, CA

Keywords

nanocomposites, release rate, ICP-OES, silica nanoparticles

Citation

Rabb, S. , Yu, L. and Bernard, C. (2010), An Analytical Method to Quantify Silica Nanoparticles Accumulated on the Surface of Polymer Nanocomposites Exposed to UV Radiation, Nanotech Conference Technical Proceedings, Anaheim, CA (Accessed December 1, 2021)
Created June 21, 2010, Updated March 27, 2017