Doss, M.
, Chandler-Horowitz, D.
, Marchiando, J.
, Krause, S.
and Seraphin, S.
(1991),
Analysis for the Characterization of Oxygen Implanted Silicon (SIMOX) by Spectroscopic Ellipsometry, Proc., Materials Research Society Symposium, Boston, MA, USA
(Accessed January 24, 2025)
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Analysis for the Characterization of Oxygen Implanted Silicon (SIMOX) by Spectroscopic Ellipsometry
Published
Author(s)
M. G. Doss, , , S. J. Krause, S. Seraphin
Proceedings Title
Proc., Materials Research Society Symposium
Volume
209
Conference Dates
November 26-December 1, 1990
Conference Location
Boston, MA, USA
Pub Type
Conferences
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 30, 1991, Updated October 12, 2021