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Activation of the Si(100)/Cl2 etching reaction at high Cl2 translational energies, Mat.

Published

Author(s)

F X. Campos, G C. Weaver, C J. Waltman, S R. Leone
Citation
Res Soc Symp Proc
Volume
236

Citation

Campos, F. , Weaver, G. , Waltman, C. and Leone, S. (1992), Activation of the Si(100)/Cl<sub>2</sub> etching reaction at high Cl<sub>2</sub> translational energies, Mat., Res Soc Symp Proc (Accessed May 24, 2024)

Issues

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Created December 31, 1991, Updated October 12, 2021