Campos, F.
, Weaver, G.
, Waltman, C.
and Leone, S.
(1992),
Activation of the Si(100)/Cl<sub>2</sub> etching reaction at high Cl<sub>2</sub> translational energies, Mat., Res Soc Symp Proc
(Accessed September 12, 2024)
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Activation of the Si(100)/Cl2 etching reaction at high Cl2 translational energies, Mat.
Published
Author(s)
F X. Campos, G C. Weaver, C J. Waltman,
Citation
Res Soc Symp Proc
Volume
236
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 1991, Updated October 12, 2021