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Accuracy in Integrated Circuit Dimensional Measurements

Published

Author(s)

James E. Potzick

Abstract

The measurement of critical dimensions of features on integrated circuits and photomasks is modeled as the comparison of the images of the test object and of a standard object in a measuring device. A length measuring instrument is then a comparator. The calibration of the standard and the conditions necessary for a valid comparison are discussed. The principles discussed here apply to many other types of measurement as well.
Citation
Chapter 3 in: Handbook of Critical Dimension Metrology and Process Control
Publisher Info
SPIE-International Society for Optical Engineering,

Keywords

accuracy, measurement, measurement uncertainty, modeling, traceability

Citation

Potzick, J. (1994), Accuracy in Integrated Circuit Dimensional Measurements, SPIE-International Society for Optical Engineering, (Accessed April 19, 2024)
Created December 1, 1994, Updated February 19, 2017