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A 193 nm Laser Detector Nonlinearity Measurement System



Darryl A. Keenan, Holger Laabs, Shao Yang, Marla L. Dowell


To meet the semiconductor industry's demands for accurate measurements, we have developed a method to characterize the nonlinear response of 193 nm excimer laser detectors. This system is complimentary to our other excimer laser power and energy calibration services and provides a quantitative measurement of a detector's response over a large energy/power range. Detectors are typically used over a larger energy/power range than that covered by a single calibration point. Measurement uncertainty can be introduced if the nonlinear response is not quantified. Range discontinuity, e.g., due to change in detector amplification, can also introduce additional measurement uncertainty. Experimental results revealed nonlinearity of some UV detectors as high as 8%.
Proceedings Title
Proc., Measurement Science Conference
Conference Dates
January 13-17, 2003
Conference Location
Anaheim, CA, USA


193 nm, nonlinearity


Keenan, D. , Laabs, H. , Yang, S. and Dowell, M. (2003), A 193 nm Laser Detector Nonlinearity Measurement System, Proc., Measurement Science Conference, Anaheim, CA, USA (Accessed April 20, 2024)
Created December 31, 2002, Updated October 12, 2021