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10 T? and 100 T? Resistance Comparison between NIST and AIST

Published

Author(s)

Dean G. Jarrett, Takehiko Oe, Nobu Kaneko, Shamith U. Payagala

Abstract

We report the results of a comparison of 10 TΩ and 100 TΩ high resistance standards between the National Institute of Standards and Technology (NIST) and the National Institute for Advanced Industrial Science and Technology (AIST). Three standard resistors were hand carried between both laboratories, a 100 TΩ from NIST and a 10 TΩ and 100 TΩ from AIST. The two laboratories agreed to within 80 x 10-6 at 10 TΩ and 500 x 10-6 at 100 TΩ. The comparison results have given both laboratories an external check of their measurement systems and scaling processes to 100 TΩ.
Proceedings Title
CPEM 2018 Conference Digest
Conference Dates
July 8-13, 2018
Conference Location
Paris, -1
Conference Title
Conference on Precision Electromagnetic Measurements (CPEM) 2018

Keywords

high resistance, standard resistor, dual source bridge, voltage injection, uncertainty

Citation

Jarrett, D. , Oe, T. , Kaneko, N. and Payagala, S. (2018), 10 T? and 100 T? Resistance Comparison between NIST and AIST, CPEM 2018 Conference Digest, Paris, -1, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=925143 (Accessed June 21, 2021)
Created July 9, 2018, Updated July 25, 2019