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Michael P. Stocker

Michael Stocker is a CNST/UMD Postdoctoral Researcher in the Nanofabrication Research Group.  He received a B.S. in Chemistry from Wheaton College (Illinois) and a Ph.D. in Chemistry from the University of Maryland, College Park.  His doctoral research focused on using two-photon lithography to characterize the radical photoinitiators used for multiphoton absorption polymerization and on simulating the deactivation kinetics involved in resolution augmentation through photo-induced deactivation lithography. Michael is working with J. Alexander Liddle measuring photo-generated acid diffusion in chemically-amplified resists using super-resolution fluorescence microscopy. 
 

Selected Publications

  • Elucidating the kinetics and mechanism of RAPID lithography, M. P. Stocker and J. T. Fourkas, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 824902 (2012).
  • Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time, M. P. Stocker, L. Li, R. R. Gattass, and J. T. Fourkas, Nature Chemistry 3, 223–227 (2011).
 
Created February 23, 2019