Michael Stocker is a CNST/UMD Postdoctoral Researcher in the Nanofabrication Research Group. He received a B.S. in Chemistry from Wheaton College (Illinois) and a Ph.D. in Chemistry from the University of Maryland, College Park. His doctoral research focused on using two-photon lithography to characterize the radical photoinitiators used for multiphoton absorption polymerization and on simulating the deactivation kinetics involved in resolution augmentation through photo-induced deactivation lithography. Michael is working with J. Alexander Liddle measuring photo-generated acid diffusion in chemically-amplified resists using super-resolution fluorescence microscopy.