Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

J. Trey Diulus (Fed)


Trey is currently an NRC Fellow at NIST in the Nanoscale Device Characterization Division of the Physical Measurement Lab, working under Dr. Andrei Kolmakov. Trey’s research background focuses on the fundamental aspects of molecule surface interactions. Trey is proficient at using multiple surface characterization techniques, including temperature programmed desorption (TPD), electron stimulated desorption (ESD), scanning electron microscopy (SEM), atomic force microscopy (AFM), Auger electron spectroscopy (AES), and X ray photoelectron spectroscopy (XPS), to study single crystal surfaces and thin film/2D materials. His current research at NIST is aimed at studying diamond surfaces for high-power/high-temperature transistor device applications.


As an undergraduate student in Prof. Dr. Jason Weaver’s group at the University of Florida, Trey began his research tenure in the field of surface science by studying the kinetics of multiple adsorbates on a PdO(101)/Pd(111) system, which can be utilized as an oxidation catalyst for a wide range of applications. Throughout his PhD studies in Prof. Dr. Greg Herman’s group at Oregon State University, he became an expert in numerous surface characterization techniques and studied multiple areas of surface chemistry, specifically for semiconductor processing (mechanistic analysis of interactions during extreme ultraviolet (EUV) exposure to organometallic photoresists), fundamental catalysis (In Situ chemical analysis of 2-propanol oxidation on a SnO2(110) single crystal), and thin-film characterization applications (surface characterization of co- sputter deposited NiGa, CoGe, and TaWSi thin-films). All his PhD studies primarily utilized the lab-based SPECS APXPS user facility at Oregon State University His postdoc at the University of Zurich under supervision by Prof. Dr. Juerg Osterwalder led to a new focus in utilizing 2D materials for catalytic and electronic applications. Through this position, he was a resident guest scientist at the Paul Scherrer Institute, working at the In Situ Spectroscopy beamline (X07DB) at the Swiss Light Source (SLS) focusing on ambient pressure XPS (APXPS) studies of h-BN/Cu, in addition to solid-liquid interface measurements to look at more fundamental electrochemistry mechanisms using the solid-liquid interface chamber (SLIC).


  1. Beckord, J., Diulus, J. T., Novotny, Z., Osterwalder, J. & Hengsberger, M., Protected ultrathin cuprous oxide film for photocatalysis: Excitation and relaxation dynamics. Physical Review Materials 7, 045801 (2023).
  2. Lorona, S. P., Trey Diulus, J., Bergevin, J. E., Addou, R. & Herman, G. S., Operando study of the preferential growth of SiO2 during the dry thermal oxidation of Si0.60 Ge0.40 (001) by ambient pressure x-ray photoelectron spectroscopy. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 39, 053202 (2021).
  3. Comini, N., Huthwelker, T., Diulus, J. T., Osterwalder, J. & Novotny, Z., Factors influencing surface carbon contamination in ambient pressure x-ray photoelectron spectroscopy experiments. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 39, 043203 (2021).
  4. Diulus, J. T., Tobler, B., Osterwalder, J. & Novotny, Z., Thermal oxidation of Ru(0001) to RuO2(110) studied with ambient pressure x-ray photoelectron spectroscopy. Journal of Physics D: Applied Physics 54, 244001 (2021).
  5. Diulus, J. T. et al., Effect of Ambient Conditions on Radiation-Induced Chemistries of a Nanocluster Organotin Photoresist for Next-Generation EUV Nanolithography. ACS Applied Nano Materials 3, 2266-2277 (2020).
  6. Diulus, J. T., Elzein, R., Addou, R. & Herman, G. S., Surface chemistry of 2-propanol and O2 mixtures on SnO2(110) studied with ambient-pressure x-ray photoelectron spectroscopy. The Journal of Chemical Physics 152, 054713 (2020).
  7. Diulus, J. T. et al., Ambent-Pressure X-ray Photoelectron Spectroscopy Characterization of Radiation-Induced Chemistries of Organotin Clusters. ACS Appl Mater Interfaces 11, 2526-2534 (2019).


  • NRC Research Associateship Fellow (2022)
  • FP RESOMUS Fellow as part of the NCCR MUST and the Cluster of Excellence RESOLV (2020)
  • Most Outstanding Graduate Student, OSU CBEE Department Award (2019)
  • American Vacuum Society Morton M. Traum Surface Science Student Award Finalist (2018)
  • AVS 65th Dorothy M. and Earl S. Hoffman Travel Grant (2018)
  • Graduate Student Poster Competition 1 Prize at Pacific NW-AVS (2018)
  • Kokes Awardee, 25th North American Catalysis Society Meeting (2017)
  • OSU Graduate School Travel Award (2017)
  • University of Florida University Scholars Fellow (undergraduate) (2014)

Relevant Links


Created December 21, 2022, Updated August 9, 2023