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Patents

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Patent description for Critical-Dimension Localization Microscopy

Apparatus for Critical-Dimension Localization Microscopy

NIST Inventors
Samuel M. Stavis and Craig Copeland
Performing critical-dimension localization microscopy includes: subjecting a first dimensional member and a second dimensional member of a reference artifact to critical-dimension metrology, the first and second dimensional members, in combination, including a critical dimension and each
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