Kaplan, S.
and Burnett, J.
(2006),
Optical Properties of Fluids For 248 nm and 193 nm Immersion Photolithography, Applied Optics (Accessed May 6, 2026)
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Optical Properties of Fluids For 248 nm and 193 nm Immersion Photolithography
Published
Author(s)
, John H. Burnett
Abstract
We present measured values of the refractive index, thermo-optic coefficient, and absorption coefficient of a number of common organic solvents and aqueous inorganic solutions that may have application in immersion photolithography at 248 nm or 193 nm wavelength. The measurements were performed with a laser-based Hilger-Chance refractometer system whose design and operation are described. The optical properties of the sample fluids are compared to water, the currently favored immersion medium, and we discuss the potential for finding higher-index fluids which will be suitable for this application.Citation
Applied Optics
Pub Type
Journals
Keywords
fluids, immersion photolithography, optical absorption, refractive index, thermo-optic coefficient
Citation
Issues
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Created March 10, 2006, Updated June 27, 2017