We discuss our approaches for measuring the absolute index (n) and its dependencies on wavelength (dn/d(lambda)) and temperature (dn/dT), of high-purity water for wavelengths near 193 nm, using the minimum deviation prism method and an interferometric technique. We present preliminary results for these quantities measured by the minimum deviation method.
Citation: SPIE Meeting
Pub Type: Journals
193 nm immersion lithography, index of refraction, refractive index, thermo-optic coefficient, water