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Optical Band Gap Dependence on Composition and Thickness of InxGa1-xN(0 less than} x less than} 0.25) Grown on GaN
Published
Author(s)
C A. Parker, J C. Roberts, S M. Bedair, M J. Reed, S X. Liu, N A. El-Masry, Larry Robins
Abstract
Band gap measurements have been carried out in strained and relaxed InxGa1-xN epilayers with x > 0.25. Values of x were determined from x-ray diffraction (XRD) of relaxed films. Band gaps measured by both Photoluminenscence (PL) and optical transmission measurements gave equivalent results, indicating the absence of a Stokes shift. Bowing parameters for both strained and relaxed films were determined to be 3.42 eV and 4.11 eV, respectively. The dependence of the band gap shift, Δ}eg, on strain is presented. The dependence of the opticla properties of InGaN on film thickness will also be discussed.
Parker, C.
, Roberts, J.
, Bedair, S.
, Reed, M.
, Liu, S.
, El-Masry, N.
and Robins, L.
(1999),
Optical Band Gap Dependence on Composition and Thickness of In<sub>x</sub>Ga<sub>1-x</sub>N(0 {less than} x {less than} 0.25) Grown on GaN, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=850339
(Accessed October 10, 2025)