Maranville, B.
, McMichael, R.
and Abraham, D.
(2008),
Variation of Thin Film Edge Magnetic Properties With Patterning Process Conditions in Ni<sub>80</sub>Fe<sub>20</sub> Stripes, Applied Physics Letters
(Accessed October 11, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Variation of Thin Film Edge Magnetic Properties With Patterning Process Conditions in Ni80Fe20 Stripes
Published
Author(s)
, , D W. Abraham
Abstract
We report the effect of etch depth on the magnetic properties of thin film edges in patterned arrays of ferromagnetic stripes. We use ferromagnetic resonance spectroscopy of transversely magnetized stripes of 20 nm-thick Ni80Fe20 to measure the edge saturation field and effective out-of-plane stiffness field of the trapped-spinwave edge mode. The primary geometrical effect of the etch depth is to change the side wall angle, or taper of the edge surface. With increasing etching depth, the edge surface angle changes from 47o to 80o, and the field required to saturate the edge magnetization perpendicular to the stripe axis nearly doubles. The trend is largely confirmed by micromagnetic modeling of the edge geometry.Citation
Applied Physics Letters
Pub Type
Journals
Keywords
ferromagnetic resonance spectroscopy, ferromagnetic stripes, micromagnetic modeling, primary geometrical effect, transversely magnetized
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created October 16, 2008