Schenck, P.
, Kaiser, D.
and Davydov, A.
(2004),
High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films, Applied Surface Science (Accessed October 25, 2026)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
High Throughput Characterization of the Optical Properties of Compositionally Graded Combinatorial Films
Published
Author(s)
, ,
Abstract
Compositionally graded combinatorial films have been characterized by a high throughput automated spectroscopic reflectometer. The data from this instrument were used to map the thickness and index of refraction of the compositionally varying films. Combinatorial films produced by dual-beam dual target pulsed laser deposition and characterized with the reflectometer include the BaTiO3-Sr TiO3 system on silicon (dielectric and ferroelectric films). In addition, combinatorial Au/Ni electrical contacts on a n-GaN/sapphire produced by e-beam vaporization have been characterized with the spectroscopic reflectometer. The Au/Ni/n-GaN/sapphire structures were characterized both as-deposited and after annealing at 400 C for 60s in flowing argon.Citation
Applied Surface Science
Volume
223
Issue
No. 1-3
Pub Type
Journals
Keywords
combinatorial, opltical properties, reflectometry, thin films
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created January 1, 2004, Updated February 19, 2017