Tanenbaum, D.
, Laracuente, A.
and Gallagher, A.
(1996),
Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition, Applied Physics Letters
(Accessed June 17, 2025)
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Nanoparticle deposition in hydrogenated amorphous silicon films during rf plasma deposition
Published
Author(s)
D M. Tanenbaum, A L. Laracuente, A Gallagher
Citation
Applied Physics Letters
Volume
68
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created January 1, 1996, Updated February 17, 2017