Garno, J.
, Zangmeister, C.
and Batteas, J.
(2007),
Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers, Journal of the American Chemical Society
(Accessed April 19, 2024)
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Automated Patterning of Nanoscale Metal-Molecule-Metal Junctions on Self-Assembled Monolayers
Published
Author(s)
, ,
Abstract
Automated scanned probe lithography has been employed to form nanoscale Cu structures through electroless metal deposition onto patterned carboxylic acid terminated self-assembled monolayers. Using this approach, Cu structures of ~ 40 nm 200 nm in lateral dimension by ~ 4 nm 6 nm in thickness were formed. Precise control of the patterning process and deposition solution conditions affords sub-nm control of the patterned architectures. The application of this process for the construction of organic based optoeletronics is discussed.Citation
Journal of the American Chemical Society
Volume
23
Pub Type
Journals
Keywords
AFM, molecular electronics, nanolithography, nanoscale materials, optolectronics
Citation
Created July 1, 2007, Updated February 19, 2017