NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
A Rapid Prototyping Technique for the Fabrication of Solvent-Resistant Structures
Published
Author(s)
C Harrison, J Cabral, Christopher M. Stafford, Alamgir Karim, Eric J. Amis
Abstract
We demonstrate a rapid prototyping technique for the fabrication of solvent-resistant channels up to and exceeding one millimeter in height. The fabrication of channels with such dimensions by conventional lithography would be both challenging and time-consuming. Furthermore, we show that this technology can be used to fabricate channels with a depth that varies linearly with distance. This technique requires only a long-wavelength ultraviolet source, a mask made by a desktop printer, and a commercially available optical adhesive. We demonstrate two lithographic methods: one which fabricates channels sealed between glass plates (closed-face) and one which fabricates structures on a single plate (open-faced). The latter is fully compatible with silicone replication techniques to make fluid handling device.
Harrison, C.
, Cabral, J.
, Stafford, C.
, Karim, A.
and Amis, E.
(2003),
A Rapid Prototyping Technique for the Fabrication of Solvent-Resistant Structures, Journal of Micromechanics and Microengineering, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852199
(Accessed October 26, 2025)