Methods are described, which are based on the use of a commercial mass spectrometer, for determination of ionization and fragment ion appearance potentials by electron impact. These methods are applied to the principal sulfur-bearing compounds produced by decomposition of SF6 by electrical discharges. The compounds investigated include: SF4, SO2, SOF2, SO2F2, SOF4, SF5Cl, S2F10, S2OF10, and S2O2F10, as well as SF6. Experimental conditions are recommended for improved sensitivity to trace levels of these decomposition by-products in SF6.
Proceedings Title: Proc., Intl. Symp. on Gaseous Dielectrics
Conference Dates: April 24-28, 1994
Conference Location: Knoxville, TN
Pub Type: Conferences
appearance potential, decomposition by-products, electron impact ionization, ionization potential, sulfur hexafluoride