Characterization of Monolayer Formation on Aluminum-Doped Zinc Oxide Thin Films

Published

August 21, 2008

Author(s)

C Rhodes, S E. Lappi, Daniel A. Fischer, S Sambasivan, Jan Genzer, S Franzen

Abstract

The optical and electronic properties of aluminum-doped zinc oxide (AZO) thin films on a glass substrate have been investigated experimentally and theoretically. Optical studies with coupling in the Kretschmann configuration reveal an angle-dependent plasma frequency in themid-IR for p-polarized radiation indicative of the detection of a Drude plasma frequency. These studies are complemented by density functional theory (DFT) studies for the calculation of the charge carrier concentration and plasma frequency for bulk AZO for varying degrees of oxygen depletion. In addition, we report on the optical and physical properties of thin film adlayers of n-hexadecanethiol (HDT) and n-octadecanethiol (ODT) self-assembled monolayers (SAMs) on AZO surfaces using variable angle reflectance FTIR spectroscopy, x-ray photoelectron spectroscopy (XPS), contact angle, and near-edge x-ray absorption fine structure (NEXAFS) spectroscopy. Our characterization of the SAM deposition onto the AZO thin film reveals a range of possible applications.

Citation

Langmuir

Volume

24

Pub Type

Journals

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Keywords

IR spectroscopy, metal oxides, NEXAFS, SAMS, thin films, XPS

Citation

Rhodes, C. , Lappi, S. , Fischer, D. , Sambasivan, S. , Genzer, J. and Franzen, S. (2008), Characterization of Monolayer Formation on Aluminum-Doped Zinc Oxide Thin Films, Langmuir, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851075 (Accessed October 10, 2025)