An Overview of Key and Supplementary Comparisons of DC Resistance Involving NIST

Published

July 1, 2006

Author(s)

Dean G. Jarrett

Abstract

Key and supplementary comparisons are of interest to the metrology community because they provide the means of demonstrating the degree of equivalence between the measurement capabilities of national metrology institutes. In recent years, NIST has been involved in both key and supplemental comparisons for DC resistance in the range 1 ?? to 1 G??. While participating in and piloting several of these comparisons, much has been learned, and as a result, both the comparison process and our view of this process has evolved. Topics that will be addressed here include development of protocols, characterization of standards, statistical analysis approaches, and the present status of several comparisons in the area of DC resistance.

Proceedings Title

Conference Proceedings of NCSL International Workshop and Symposium

Conference Dates

August 6-10, 2006

Conference Location

Nashville, TN

Conference Title

National Conference of Standards Laboratories (NCSL)

Pub Type

Conferences

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Keywords

key comparison, protocol, resistance, standards, statistical

Citation

Jarrett, D. (2006), An Overview of Key and Supplementary Comparisons of DC Resistance Involving NIST, Conference Proceedings of NCSL International Workshop and Symposium, Nashville, TN, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32282 (Accessed May 2, 2026)

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