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Probing Stress Effects in Single Crystal Organic Transistors by Scanning Kelvin Probe Microscopy
Published
Author(s)
L C. Teague, Oana Jurchescu, Curt A. Richter, Sanker Subramanian, John E. Anthony, Thomas Jackson, David J. Gundlach, James Kushmerick
Abstract
We report scanning Kelvin probe microscopy SKPM of single crystal difluoro bistriethylsilylethynyl anthradithiophene diF-TESADT organic transistors. SKPM provides a direct measurement of the intrinsic charge transport in the crystals independent of contact effects and reveals that degradation of device performance occurs over a time period of minutes as the diF-TESADT crystal becomes charged.
Teague, L.
, Jurchescu, O.
, Richter, C.
, Subramanian, S.
, Anthony, J.
, Jackson, T.
, Gundlach, D.
and Kushmerick, J.
(2010),
Probing Stress Effects in Single Crystal Organic Transistors by Scanning Kelvin Probe Microscopy, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=907043
(Accessed October 10, 2025)