Verma, V.
, Stevens, M.
, Silverman, K.
, Dias, N.
, Garg, A.
, Coleman, J.
and Mirin, R.
(2011),
Photon antibunching from a single lithographically defined InGaAs/GaAs quantum dot, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=907174 (Accessed May 26, 2026)
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Photon antibunching from a single lithographically defined InGaAs/GaAs quantum dot
Published
Author(s)
, , , Neville Dias, Akash Garg, James J. Coleman, Richard Mirin
Abstract
We demonstrate photon antibunching from a single lithographically defined quantum dot fabricated by electron beam lithography, wet chemical etching, and overgrowth of the barrier layers by metalorganic chemical vapor deposition. Measurement of the second-order autocorrelation function indicates g(2)(0) = 0.395 ± 0.030, below the 0.5 limit necessary for classification as a single photon source.Citation
Applied Physics Letters
Volume
19
Pub Type
Journals
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Created February 28, 2011, Updated May 7, 2026