Li, W.
, Hacker, C.
, Cheng, G.
, Hight, A.
, Richter, C.
, Gundlach, D.
, Liang, Y.
, Tian, B.
, Liang, X.
and Peng, L.
(2014),
Highly reproducible and reliable metal/graphene contact by UV-Ozone treatment, Journal of Applied Physics
(Accessed April 19, 2024)
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Highly reproducible and reliable metal/graphene contact by UV-Ozone treatment
Published
Author(s)
, , , , , , Yiran Liang, boyuan Tian, Xuelei Liang, Lianmao Peng
Abstract
Resist residue from the device fabrication process is a significant source of contamination at the metal/graphene contact interface. Ultraviolet Ozone (UVO) treatment is proven here, by X-ray photoelectron spectroscopy (XPS) and Raman measurement, to be an effective way of cleaning the metal/graphene interface. Electrical measurements of devices which were fabricated by using UVO treatment of the metal/graphene contact region show that stable and reproducible low resistance metal/graphene contacts are obtained and the electrical properties of the graphene channel remain unaffected.Citation
Journal of Applied Physics
Volume
115
Issue
11
Pub Type
Journals
Keywords
graphene, metal/graphene contact, residue
Citation
Created March 17, 2014, Updated February 19, 2017