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PUBLICATIONS

Tracking down sources of carbon contamination in EUVL exposure tools

Published

Author(s)

Charles S. Tarrio, Robert E. Vest, Thomas B. Lucatorto, R. Caudillo

Abstract

Optics in EUVL exposure tools are known to suffer reflectivity degradation, mostly from the buildup of carbon. The sources of this carbon have been difficult to identify. Vacuum cleanliness is normally monitored with a residual gas analyzer, but this has not shown carbon-containing species in sufficient concentration to account for the observed carbon buildup. We have developed a technique based on cryo trapping followed by gas chromatography with mass spectrometry analysis that is more sensitive to less-volatile compounds. We will present sample data on model systems as well as a preliminary analysis of a micro-exposure tool.
Proceedings Title
Proceedings of SPIE, Vol. 7271, Alternative Lithographic Technologies
Volume
7271
Conference Dates
February 24-26, 2009
Conference Location
San Jose, CA
Conference Title
Alternative Lithographic Technologies
Pub Type
Conferences

Keywords

contamination, outgassing, vacuum
Optical physics and communications

Citation

Tarrio, C. , Vest, R. , Lucatorto, T. and Caudillo, R. (2009), Tracking down sources of carbon contamination in EUVL exposure tools, Proceedings of SPIE, Vol. 7271, Alternative Lithographic Technologies, San Jose, CA (Accessed October 27, 2025)

Issues

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Created August 3, 2009, Updated February 19, 2017
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