NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Afterpulse reduction through prompt quenching in silicon reach-through single-photon avalanche diodes
Published
Author(s)
Michael A. Wayne, Joshua C. Bienfang, Allessandro Restelli, P. G. Kwiat
Abstract
Reducing afterpulsing in single-photon avalanche diodes (SPADs) allows operation with shorter recovery times and higher detection rates. Afterpulsing in SPADs can be reduced by reducing the total avalanche charge. We use a periodic quenching system to arbitrarily vary the latency between the onset of an avalanche and the application of the quench, allowing us to characterize the afterpulsing behavior when the current flow is halted at time scales that are significantly shorter than can be achieved by standard active-quenching systems. Three different reach-through SPADs are characterized, and with prompt quenching we observe reductions in afterpulse probability of as much as a factor of 12. Beyond improving detection rates, reducing the total avalanche charge can also allow operation with higher excess bias voltages, which enables higher detection efficiency and more precise timing resolution.
Wayne, M.
, Bienfang, J.
, Restelli, A.
and Kwiat, P.
(2014),
Afterpulse reduction through prompt quenching in silicon reach-through single-photon avalanche diodes, Journal of Lightwave Technology, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=916039
(Accessed October 10, 2025)