Anders, M.
, Lenahan, P.
and Lelis, A.
(2018),
The Effect of Nitrogen on the 4H-SiC/SiO2 Interface Studied with Variable Resonance Frequency Spin Dependent Charge Pumping, Materials Science Forum, [online], https://doi.org/10.4028/www.scientific.net/MSF.924.469, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=929098 (Accessed June 18, 2026)
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The Effect of Nitrogen on the 4H-SiC/SiO2 Interface Studied with Variable Resonance Frequency Spin Dependent Charge Pumping
Published
Author(s)
, Patrick M. Lenahan, Aivars Lelis
Citation
Materials Science Forum
Volume
924
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact [email protected].
Created June 5, 2018, Updated May 20, 2026