The group is recognized for their pioneering advances in optical microscopy, including first-in-the-world quantitative measurements of structures 30 times smaller than the wavelength of the light used to measure them. The group has paved the way for U.S. semiconductor manufacturers and equipment suppliers to resolve critical issues in deep subwavelength linewidth and defect metrology. Innovations in structured illumination and 3-D scattered-light-field analysis enabled the group to unlock quantitative information from images at near-atomic scales, a resolution previously thought impossible.