NIST will exhibit at the International Conference on Frontiers of Characterization and Metrology for Nanoelectronics
The FCMN will bring together scientists and engineers interested in all aspects of the characterization technology needed for nanoelectronic materials and device research, development, and manufacturing. All approaches are welcome: chemical, physical, electrical, magnetic, optical, in-situ, and real-time control and monitoring. The conference will summarize major issues and provided critical reviews of important semiconductor techniques needed as the semiconductor industry moves to silicon nanoelectronics and beyond.
The conference consists of formal invited presentation sessions and poster sessions for contributed papers. The poster papers cover new developments in characterization and metrology especially at the nanoscale. The conference series began 1995 and is the 11th conference in the series.