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X-Ray Absorption Fine-Structure Determination of Ferroelectric Distortion in SrtiO3 Thin Films grown on Si(001)

Published

Author(s)

Joseph Woicik, F S. Aguirre-Tostado, A Herrera-Gomez, R Droopad, Z Yu, D G. Schlom, E Karapetrova, P Zschack, P Pianetta

Abstract

Polarization-dependent x-ray absorption fine structure together with x-ray diffraction have been used to study the local structure in SrTiO3 thin films grown on Si(001). Our data indicate that below a critical thickness of approximately 80 , the in-plane compressive strain imposed on the SrTiO3 layer by the Si substrate results in a tetragonal plus displacive ferroelectric distortion of the SrTiO3 unit cell.
Proceedings Title
Proceedings for the EXAFS XII Conference
Conference Dates
June 21-27, 2003
Conference Location
Malmo, 1, SW
Conference Title
EXAFS Conference

Keywords

ferroelectric, polarization, Ti-O, x-ray absorption

Citation

Woicik, J. , Aguirre-Tostado, F. , Herrera-Gomez, A. , Droopad, R. , Yu, Z. , Schlom, D. , Karapetrova, E. , Zschack, P. and Pianetta, P. (2017), X-Ray Absorption Fine-Structure Determination of Ferroelectric Distortion in SrtiO<sub>3</sub> Thin Films grown on Si(001), Proceedings for the EXAFS XII Conference, Malmo, 1, SW (Accessed February 22, 2024)
Created February 19, 2017