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Variation of Thin Film Edge Magnetic Properties With Patterning Process Conditions in Ni80Fe20 Stripes



Brian B. Maranville, Robert D. McMichael, D W. Abraham


We report the effect of etch depth on the magnetic properties of thin film edges in patterned arrays of ferromagnetic stripes. We use ferromagnetic resonance spectroscopy of transversely magnetized stripes of 20 nm-thick Ni80Fe20 to measure the edge saturation field and effective out-of-plane stiffness field of the trapped-spinwave edge mode. The primary geometrical effect of the etch depth is to change the side wall angle, or taper of the edge surface. With increasing etching depth, the edge surface angle changes from 47o to 80o, and the field required to saturate the edge magnetization perpendicular to the stripe axis nearly doubles. The trend is largely confirmed by micromagnetic modeling of the edge geometry.
Applied Physics Letters


ferromagnetic resonance spectroscopy, ferromagnetic stripes, micromagnetic modeling, primary geometrical effect, transversely magnetized


Maranville, B. , McMichael, R. and Abraham, D. (2008), Variation of Thin Film Edge Magnetic Properties With Patterning Process Conditions in Ni<sub>80</sub>Fe<sub>20</sub> Stripes, Applied Physics Letters (Accessed July 17, 2024)


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Created October 16, 2008