Variable Magnification of Kirkpatrick-Baez Optics for Xynchrotron X-Ray Absorption Microscopy

Published

October 16, 2008

Author(s)

Terrence J. Jach, A S. Bakulin, S M. Durbin, J Pedulla, A T. Macrander

Abstract

Hard x-ray imaging microscopy using multilayer-coated Kirkpatrick-Baez mirrors produces absorption images with one micron resolution or better when used with a low-divergence synchrotron source. Because the incident x-ray beam nearly corresponds to an ideal plane-wave source, the usual optical description of the K-B optics must be modified. It is found that image formation is no longer governed by the lens maker s law, the image quality is nearly independent of the object distance from the optics, and the magnification increases linearly as the image plane is further removed from the optics. This surprising flexibility of the image formation, along with high resolution, good field of view, and greatly improved image acquisition time, suggests new opportunities for synchrotron x-ray absorption microscopy.

Citation

Applied Optics

Pub Type

Journals

Keywords

Kirkpatrick-Baez, microscope, multilayer, x-ray optics

Citation

Jach, T. , Bakulin, A. , Durbin, S. , Pedulla, J. and Macrander, A. (2008), Variable Magnification of Kirkpatrick-Baez Optics for Xynchrotron X-Ray Absorption Microscopy, Applied Optics (Accessed October 13, 2025)