The Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration

Published

January 1, 2002

Author(s)

C J. Taylor, Stephen Semancik

Abstract

An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 C. Deposition was confined to the microhotplate elements within the 4- and 16-element arrays.Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated micro-contacts during the deposition of TiO₂ using titanium(IV) isopropoxide. A novel approach using temperature programmed deposition with temperature ramp rates up to 800 C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.

Citation

Chemistry of Materials

Volume

14

Issue

No. 4

Pub Type

Journals

Keywords

chemical vapor deposition, combinatorial, materials, microstructure, temperature programming, titanium dioxide

Citation

Taylor, C. and Semancik, S. (2002), The Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration, Chemistry of Materials (Accessed May 18, 2025)