Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

The Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration



C J. Taylor, Stephen Semancik


An approach for high-throughput rapid screening of chemical vapor deposition (CVD) materials using micromachined silicon microheater arrays is described. To illustrate this approach, titanium dioxide was deposited by CVD, using titanium(IV) nitrate and titanium(IV) isopropoxide at temperatures between 130 and 815 C. Deposition was confined to the microhotplate elements within the 4- and 16-element arrays.Film microstructure was examined by scanning electron microscopy. In situ electrical measurements were made with integrated micro-contacts during the deposition of TiO2 using titanium(IV) isopropoxide. A novel approach using temperature programmed deposition with temperature ramp rates up to 800 C/s was also employed for microstructure modification during deposition. Additionally, the steep temperature gradients present on the microhotplate supports have been demonstrated to provide an excellent platform for investigating temperature-dependent microstructures.
Chemistry of Materials
No. 4


chemical vapor deposition, combinatorial, materials, microstructure, temperature programming, titanium dioxide


Taylor, C. and Semancik, S. (2002), The Use of Microhotplate Arrays as Microdeposition Substrates for Materials Exploration, Chemistry of Materials (Accessed May 26, 2024)


If you have any questions about this publication or are having problems accessing it, please contact

Created January 1, 2002, Updated February 17, 2017