NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Thermal Conductivity Measurements of Thin-Film Silicon Dioxide

Published

Author(s)

Harry A. Schafft, John S. Suehle, P. G. Mirel
Proceedings Title
Proc. ICMTS 1989, Intl. Conf. on Microelectronic Test Structures
Conference Dates
March 13-14, 1989
Conference Location
Edinburgh, 1, UK
Pub Type
Conferences

Citation

Schafft, H. , Suehle, J. and Mirel, P. (1989), Thermal Conductivity Measurements of Thin-Film Silicon Dioxide, Proc. ICMTS 1989, Intl. Conf. on Microelectronic Test Structures, Edinburgh, 1, UK (Accessed November 7, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1989, Updated October 12, 2021
Was this page helpful?