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Surface-directed Growth of Nanowires: A Scalable Platform for Nanodevice Fabrication



Babak Nikoobakht


Optical lithography continues to be the popular technique for further miniaturization of electronic circuitry and its components. However, as further device miniaturization continues, complexity of pattern generation and cost increase; therefore the use of such techniques become dominantly specific to high-end applications such as microprocessor manufacturing. As an alternative, nanomaterials and non-conventional nanofabrication methods such as “bottom-up” chemical approaches offer great opportunities in producing useful nanostructure-based devices with potential advantages such as enhanced performance and/or lower cost. Majority of the produced nanomaterials for device applications require post processing “e.g.” transfer from a source- to a target substrate. For composite structures this transfer is not a concern, but for producing intricate nanodevices with a large scale hierarchical order, this step becomes a bottleneck as it requires knowledge on surface registries of a large group of nanocrystals on a given surface that is needed for the succeeding fabrication steps.
Publisher Info
Intech Publishing, Vienna, -1


Nanowire, nanofabrication, light emitting diode, field-effect transistor, directed growth, nanomaterial, bottom-up chemical approaches
Created July 11, 2011, Updated February 19, 2017